Major 

Electronic Engineering
 
 
 Research Interests

Opto-electronic Materials
Transparent Conductive Oxide Films (TCO Electrode Materials)
Electrochromic Materials (EC)
Photocatalysis Materials

  
 
 Education 

Ph. D., Tokyo University, Japan, 1999
 
 
 Selected Publications 
  1. Study on Crystallinity of Tin-doped Indium Oxide Films Deposited by DC Magnetron Sputtering, Pung Keun Song, Yuzo Shigesato, Itaru Yasui, Cleva W. Ow-Yang and David C. Paine, Jpn. J. Appl. Phys. Vol.37, No.4A (1998) 1870-1876

2. Electrical and Structural Properties of Tin-doped Indium Oxide Films Deposited by DC Sputtering at Room Temperature, Pung Keun Song, Yuzo Shigesato, Masayuki Kamei and Itaru Yasui, Jpn. J. Appl. Phys. Vol. 38, No.5A (1999) 2921-2927.

3. Preparation and Crystallization of Tin-doped and Undoped Amorphous Indium Oxide Films Deposited by Sputtering, Pung Keun Song, Hirotaka Akao, Masayuki Kamei, Yuzo Shigesato and Itaru Yasui, Jpn. J. Appl. Phys Vol.38, No. 9A (1999) 5224-5226.

4. Structural Control of TCO Films, Pung Keun Song and Yuzo Shigesato, The Journal of the Surface Finishing Society of Japan, Vol.50, No.9 (1999) 771-776.

5. The Trend of Transparent Conductive Films based In2O3, Pung Keun Song and Yuzo Shigesato, Monthly DISPLAY, Vol.5, No.9 (1999) 16-21.

6. Zinc Oxide as Transparent Conductive Films: P. K. Song, Y. Shigesato, MATERIALS INTEGRATION/ ELECTRONIC CERAMICS, Vol12, No12 (1999) 15-20.

7. Deposition　Of　High　Performance Ceramic　Thin　Films　by Sputtering　Method, P. K. Song, Y. Shigesato, Jpn. C.T.I, Vol.7 (2000) 26-29.

8. ITO Deposition by Reactive dc Sputtering with Ozone Introduction, Y. Shigesato, N. Ito, M. Kon and P. K. Song, J. Vac. Soc. Jpn. Vol. 43, No.8 (2000) 779-784.

9. Study on Fluorine-Doped Indium Oxide Films Deposited by RF Magnetron Sputtering, Y. Shigesato, N. Shin, M. Kamei, P. K. Song and I. Yasui, Jpn. J. Appl. Phys. Vol.39, No.11, (2000) 6422-6426.

10. Al-Doped ZnO Films Deposited by Reactive Magnetron Sputtering in MF Mode with Dual Cathodes, M. Kon, P. K. Song, Y. Shigesato, P. Frach, A. Mizukami, K. Suzuki, Jpn. J. Appl. Phys. Vol.41, No. 2A, (2002) 814-819.

11. Electrical and optical properties of gallium doped zinc oxide films deposited by dc magnetron sputtering, P. K. Song, M. Watanabe, M. Kon, A. Mitsui and Y. Shigesato,
Thin Solid Films, Vol.411, (2002) 82-86.

12. Crystallinity and stoichiometry of InNx films deposited by reactive dc magnetron sputtering, Vacuum, P. K. Song, D. Sato, M. Kon and Y. Shigesato, Vol.66 (2002).373-378.

13. Structural and Photocatalytic Properties of Epitaxial TiO2 Films Deposited by Sputtering, M. Yamagishi, Y. Irie, P. K. Song, Y. Shigesato and H. Odaka, Kougyou Zairyou, Vol.50, No.7 (2002) 27-32.

14. Crystallinity of Gallium-Doped Zinc Oxide Films Deposited by DC Magnetron Sputtering Using Ar, Ne or Kr Gas, M. Kon, P. K. Song, A. Mitsui and Y.Shigesato, Jpn. J. Appl. Phys. Vol.41, No. 10, (2002) 6174-6179.

15. Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films, M. Kon, P. K. Song, Y. Shigesato, P. Frach, S. Ohno, K. Suzuki, Jpn. J. Appl. Phys. Vol.42, No. 1 (2003) 263-269.

16. Sn- or Hf- Doped InSbO4 Films Deposited by RF Magnetron Sputtering, P. K. Song, Y. Shimada, Y. Shigesato, T. Hattori, M. Ishida and K. Saegusa, Thin Solid Films, 442 (2003) 184-188.

17. Thin film TiO2 photocatalyst deposited by reactive magnetron sputtering, M. Yamagishi, S. Kuriki, P. K. Song and Y. Shigesato, Thin Solid Films, Thin Solid Films, 442 (2003) 227-231.

18. Study on Thermochromic VO2 Films Grown on ZnO Coated Glass Substrates for "Smart windows, K. Kato, P. K. Song, Y. Shigesato, H. Odaka, Jpn. J. Appl. Phys. Vol.42 (2003) 6523-6531.

19. Plasma emission control of reactive sputtering process in mid-frequency mode with dual cathodes to deposit photocatalytic TiO2 films, S. Ohno, D. Sato, M. Kon, P. K. Song, Y. Shigesato, M. Yoshikawa, S. Suzuki and P. Frach,
Thin Solid Films, Vol. 445 (2003) 207-212.

20. Comparative study on structure and internal stress in tin-doped indium oxide (ITO) and indium-zinc oxide (IZO) films deposited by rf magnetron sputtering, T. Sasabayashi, N. Ito, M. Kon, P. K. Song, K. Utsumi, A. Kaijo and Y. Shigesto, Thin Solid Films, Vol. 445 (2003) 219-223.

21. Study on In2O3-SnO2 transparent and conductive films prepared by dc magnetron sputtering using high density ceramic targets, K. Utsumi, H. Iigusa, R. Tokumaru, P. K. Song and Y. Shigesato, Thin Solid Films, Vol. 445 (2003) 229-234.

22. Microstructure of ITO films deposited by DC magnetron sputtering with H2O introduction, E. Nishimura, P. K. Song, H. Ookawa, Y. Shigesato, Thin Solid Films, Vol. 445 (2003) 235-240.

23. Microstructure Effect on the High-Temperature Oxidation Resistance of Ti-Si-N
Coatings Layers, J. B. Choi, K. Cho, K. H. Kim and P. K. Song, Jpn. J. Appl. Phys. Vol. 42 (2003) 6556-6559.

24. Photoinduced Hydrophilicity of Epitaxially Grown TiO2 Films by RF Magentron Sputtering, P. K. Song, M. Yamagishi, H. Odaka and Y. Shigesato, Jpn. J. Appl. Phys. Vol. 42 (2003) 1529-1531

25. GaN Films Deposited by DC Reactive Magnetron Sputtering, P. K. Song, E. Yoshida, Y. Sato. K. H. Kim and Y. Shigesato, Jpn. J. Appl. Phys., Vol. 43 (2004) 164-166.

26. Crystallinity and Photocatalytic Activity of TiO2 Films Deposited by Reactive Sputtering Using Various Magnetic Field Strengths, P. K. Song, Y. Irie, S. Ohno, Y. Sato and Y. Shigesato, Jpn. J. Appl. Phys., Vol. 43 (2004) 442-445.

27. Crystal Structure and Photocatalytic Activity of TiO2 Films Deposited by Reactive Sputtering Using Ne, Ar, Kr, or Xe Gases, Jpn. J. Appl. Phys., 43 (2004) 358-361.

  
 
 Professional Experiences 

Assistant Lecture, Aoyama Gakuin University, Japan (1999-2004)
Assistant Professor, School of Materials science and Engineering, Pusan National University, Korea (2004.5-Present)

  
 
 Professional Societies & Activities 

1. Member, Japan Applied Physics Society
2. Member, Japan Ceramic Society
3. Member, Korean Ceramic Society
4. Organizing Committee, International Symposium on TOEO (2001, 2003)
5. Member, Japan Society for the Promotion of Science (JSPS) 166th Committee on Photonic and Electronic Oxide Materials (1999.4-2004.3)
6. Committee of Standardization of Various Display, JFCC, Japan (2000-2002)
7. Member of Center of Excellent (COE) in Aoyama Gakuin University (2001-present)

  
 
 Honors and Awards 

  
 
 International Joint Research & Activities 

New TCO Films (Professor Yozo Shigesato, Aoyama Gakuin University, Japan)